Product overview

The Automated Wafer Inspection Microscope are wafer-level automated inspection devices for industries such as semiconductors, panel displays, and photovoltaics. They provide efficient and accurate solutions for sample inspection, analysis, and processing.

Product Positioning

The Automated Wafer Inspection Microscope utilizing Zeiss optics technology, integrating modular design and intelligent algorithms, these microscopes cover the complete needs of wafers, from automated loading and unloading, multi-dimensional inspection, defect marking to report generation, balancing ease of use and professionalism.

Advantages

① High-efficiency working modes

② Turnkey wafer inspection solution

③ Real-time measurement, providing accurate data

④ Abundant objective lens options

⑤ Intelligent and fast autofocus

⑥ Intelligent and efficient laser defect marking

⑦ Navigation map preview, drawing comparison, accurate positioning

⑧ Third-party compatibility, enabling automated wafer handling

Applications

Semiconductor Manufacturing
Panel Display
Photovoltaic Industry

Parameters

XY stage	8-inch wafer XY manual/motorized stage module XY accuracy：≤2 μm Travel range：205 mm × 205 mm Clutch handle for fast movement
Z-axis stage	Z-axis handwheel Z-axis fine-tuning accuracy：≤1 μm Travel range：≥36 mm
Objective lens	Adopt Zeiss' original manual/electric microscope nosepiece Zeiss EC EpiPlan Objectives, EC Epiplan Apochromat Objectives, and EC Epiplan Neofluar Objectives
Light source	5W LED transmitted light source 10W LED reflective light source
Wafer load stage	Compatible with multi-size wafer stage (compatible with 4-inch, 6-inch, and 8-inch wafers) Transmission allowed, detachable wafer workbench, and the detection function of the LCD panel is supported
Imaging observation	Compatible with Zeiss Axiocam series cameras or 3rd part cameras Eyepieces for Zeiss (optional) Offers bright field and dark field observation modes, with optional differential Interference Contrast, fluorescence, and polarized modes
Remote control handle	Objective lens switching button Illumination light intensity control button, and can automatically adjust the current light intensity according to the objective lens/observation mode Reflected illumination and transmitted illumination toggle button Telex Z-axis focus knob, XY motion axis remote sensing Defect marking and the autofocus button
Autofocus module	Compatible with active autofocus module, realizing real-time focusing function of the observed object under 50× objective
Defect marking module	Compatible with the defect marking module to achieve real-time marking of sample defect parts
Wafer handling module	Compatible with wafer handling modules to achieve automatic loading and unloading of wafers

FAQ

What size wafers can it inspect? Can it inspect other sizes?

It's compatible with 4-inch, 6-inch, and 8-inch wafers. With the stage removed, it can also be used to inspect LCD panels.

What optical technology does it utilize?

It continues Zeiss's century-old optical quality and integrates the advantages of ICCS optics. All objectives are original Zeiss lenses, including achromatic, semi-apochromatic, and apochromatic types. It also supports brightfield, darkfield, DIC, polarized, and fluorescence observation modes.

Is it difficult to operate? Do I need to assemble the modules myself?

No, it's a turnkey solution. Ergonomic eyepieces, a remote handle, and operating software are all integrated. The entire process requires no additional development, and even beginners can quickly get started.

Can it be operated automatically or remotely controlled?

It can be remotely controlled using the handle, which has shortcut keys for switching objectives and adjusting illumination. It can also be equipped with a motorized XYZ stage, autofocus, and wafer handling modules, enabling automatic loading and unloading and continuous focus tracking.

How is the displacement accuracy? How well does the autofocus work?

The XY motorized stage achieves an accuracy of ≤2μm, and the Z-axis fine-tuning accuracy is ≤1μm. Autofocus utilizes a 660nm/780nm/808nm light source, a high-frame-rate camera, and algorithms, enabling rapid focusing and continuous tracking. It also supports upgrades for the Zeiss Axioscope series microscopes.

On which materials can laser defect marking be used?

Two lasers, 450nm and 532nm, are available. Materials such as chromium, aluminum, ITO, copper, and silicone resin can be used for sub-micron level marking and repair.

Certifications

Our company's optical equipment (including optical processing equipment and optical inspection equipment) has successfully obtained ISO certification.