Your Professional Thermal Processing Equipment Supplier
Nice-tech is a professional semiconductor equipment provider with a dedicated factory and an experienced technical team. Our operations are supported by multiple production lines equipped with standardized process control and key semiconductor-related equipment to ensure stable quality and delivery. The company is backed by a skilled team of engineers, technicians, and project specialists with solid industry experience, enabling effective coordination between equipment suppliers and end users.
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Mercury Annealing FurnaceThis Ion Beam Deposition Equipment is a high-precision thin film deposition system designed for the preparation of metal wire and ohmic contact thin films in infrared device manufacturing.view more
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SiC High Temperature Annealing FurnaceThe SiC High Temperature Annealing Furnace is a specialized piece of thermal processing equipment built for the production of silicon carbide (SiC) power devices. It’s mainly used to carry out high-temperature thermal processes like...view more
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SiC High Temperature Oxidation FurnaceThis SiC high-temperature oxidation furnace is a specialized thermal processing device built for silicon carbide semiconductor manufacturing. It’s mainly used to grow high-quality gate oxide layers for SiC MOSFETs, supporting processes...view more
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SiC Epitaxy FurnaceOur SiC epitaxy furnace is a specialized piece of equipment built for the homoepitaxial growth of 4H-SiC, a core material in third-generation semiconductors.view more
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Vertical Thermal Processing FurnaceOur Metal-Organic Chemical Vapor Deposition (MOCVD) equipment is a core manufacturing tool dedicated to the deposition of high-quality epitaxial materials. It is professionally designed for the preparation of gallium arsenide (GaAs),...view more
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Vertical Oxidation And Annealing FurnaceOur vertical oxidation and annealing furnace is built for reliable thermal processing in semiconductor production. It handles oxidation, annealing, and alloying for wafers used in integrated circuits, power devices, and MEMS.view more
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Semi-Automatic RTP EquipmentThis Semi-Automatic RTP Equipment is quite practical, capable of processing wafers from 8 to 12 inches. The Semi-Automatic RTP Equipment offers precise temperature control and a very low oxygen content, making it ideal for applications...view more
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Oxidation and Diffusion RTP EquipmentThe Oxidation and Diffusion RTP Equipment stands as a core thermal tool for semiconductors, packing oxidation, diffusion, and annealing capabilities into a single unit. It’s designed specifically for processing silicon-based materials...view more
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High-Temperature Oxidation RTP EquipmentOur company's High-Temperature Oxidation RTP Equipment is a core thermal equipment in large-scale semiconductor production. It is specifically designed to create clean, dense SiO₂ films on silicon substrates, suitable for manufacturing...view more
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Low-Temperature RTP EquipmentLow-Temperature RTP Equipment: It offers exceptionally precise temperature control from 250℃ to 500℃, handling heat treatment of materials such as lithium niobate and silicon effectively.view more
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Automatic RTP EquipmentThe Automatic RTP Equipment compatible with 8-12 inch wafers, featuring single/dual-cavity designs, and specifically designed for mass production. Integrating robots and other components, it achieves fully automated wafer loading,...view more
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Desktop RTP EquipmentThe Desktop RTP Equipment Adaptable to small-sized wafers, the equipment features a compact design and flexible placement. Temperature control covers room temperature to 800℃ (thermocouple) and 500℃ to 1200℃ (infrared pyrometer), with a...view more
why choose us
Tailored Solution Delivery
Our experienced team analyzes clients' specific needs to match the most suitable semiconductor equipment and offer customized solutions for different production and R&D scenarios.
Comprehensive Technical Support
We provide full-cycle technical assistance, from equipment commissioning to maintenance, including on-site troubleshooting and real-time online consultation, reducing operational hassles.
Support for Advanced Processes
We continuously invest in industry insights and adapt to cutting-edge tech trends, offering high-precision equipment solutions and upgrading services to meet high-end chip production needs.
Service Advantages
Offer 1v1 online support for equipment operation, parameter adjustment, and process optimization, responding to your questions promptly.

The Vertical Tube Furnace is a high-precision heating system designed for controlled-atmosphere or high-vacuum processes. Operating at temperatures from 1200°C to 1600°C, it is ideal for sintering, vapor deposition, brazing, and thermal treatment of ceramics, battery materials, and metallic powders.Available with high-purity quartz (1200°C) or alumina tubes (1400°C/1600°C), the system features a vertically aligned design, offering precise temperature uniformity, rapid thermal response, and exceptional safety. A double-layer shell with air cooling ensures operator protection. The system can be configured with resistance wire, SiC rods, or MoSi2 rods to suit different thermal profiles.
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Item |
Vertical Tube Furnace |
Horizontal Tube Furnace |
|
Temperature Range |
200℃-600℃,600℃-1200℃(two ranges optional) |
200℃-600℃,600℃-1200℃(two ranges optional) |
|
Temperature Control Accuracy |
≤±0.5℃ |
≤±0.5℃ |
|
Temperature Uniformity |
- |
≤±1℃ |
|
Single-point Temperature Stability |
≤±0.5℃@1100℃ for 24 consecutive hours |
≤±0.5℃@1100℃ for 24 consecutive hours |
|
Maximum Heating Rate |
10℃/min |
10℃/min |
|
Length of Constant Temperature Zone |
200-500mm |
200-500mm |
Advantages of Tube Thermal Furnace
High efficiency and energy saving:
The vertical tube furnace adopts advanced heating technology and thermal insulation materials, which can effectively reduce the loss of heat energy, improve heating efficiency and reduce energy consumption.
01
Even heating:
Through the pipeline design, the vertical tube furnace can achieve uniform heating of the workpiece and improve the heat treatment effect.
02
Precise temperature control:
Equipped with temperature sensors, controllers and feedback mechanisms, it can achieve precise control of the temperature in the furnace chamber to meet different process requirements.
03
Safe and reliable:
The vertical tube furnace is designed with emphasis on safety performance and adopts multiple protection measures to ensure safety during high temperature operation.
04
Flexible and versatile:
Vertical tube furnace can be customized according to different needs, with flexible and diverse designs, suitable for various high temperature treatment, heating experiments and other occasions.
05
Type of Tube Thermal Furnace
High-Temperature Vertical Tube Furnace
The high-temperature vertical tube furnace is capable of reaching temperatures of over 1,500 degrees Celsius. These temperatures make them ideal for metallurgical processes like sintering, annealing, and fusion.
Laboratory Vertical Tube Furnace
These furnaces are compact and designed for experimental use in research and development. They enable precise control of temperature, atmosphere, and time which are critical factors for small sample materials in chemical reactions or material testing.
Vacuum Vertical Tube Furnace
This furnace is designed to operate under low-pressure conditions in a sealed tube. These furnaces are engineered predominantly for metal treatment in an oxygen-free environment, thus preventing oxidation during the heating process.
Vertical Resistive Tube Furnace
The vertical resistive tube furnace generates heat through electric resistance elements fitted inside or outside the furnace. It offers a consistent and accurate temperature control ideal for small-diameter tube processing such as metals, glass, and ceramics.
Microwave Vertical Tube Furnace
This furnace is a new technology that uses microwave energy for heating. The microwaves directly heat materials inside the furnace. Therefore, it allows faster and often more uniform heating compared to conventional methods.
Laboratory studies:
In scientific research institutions and laboratories, it is used for various material property studies, laboratory tests and sample preparation.
Industrial production:
Used for heat treatment processes such as quenching, tempering, annealing, etc. for metal and non-metal materials, as well as sintering processes for ceramic materials.
Chemical field:
Used for the preparation of chemicals, catalysts, adsorbents, etc.
Food industry:
It is also used in the production of nutritional health products, additives, seasonings and other products.
Environmental protection:
In the field of waste residue treatment, it is used to treat sludge, solid waste, etc.
Differences between Vertical and Horizontal Furnaces
Heating Mechanism:
The heating mechanism in vertical and horizontal tube furnaces differs in terms of heat distribution and transfer. In vertical tube furnaces, the heating element surrounds the tube, ensuring efficient heat transfer through radiation or convection. This design facilitates uniform temperature distribution along the length of the sample. In contrast, horizontal tube furnaces also employ a heating element surrounding the tube, but heat transfer occurs primarily through radiation. This can result in slight temperature variations along the length of the sample.
Sample Handling:
Vertical and horizontal tube furnaces have different approaches to sample loading and positioning. In vertical tube furnaces, samples are typically inserted vertically into the tube. This allows for easy loading and unloading, especially for longer or vertically aligned samples. Horizontal tube furnaces, on the other hand, require samples to be positioned horizontally within the tube. This may involve more complex handling and positioning mechanisms, especially when dealing with larger or multiple samples.
Space and Footprint:
The space requirements and installation considerations for vertical and horizontal tube furnaces vary. Vertical tube furnaces generally have a more compact footprint, making them suitable for laboratories or facilities with limited space. They can be easily integrated into existing setups or placed on benchtops. Horizontal tube furnaces, due to their horizontal orientation, typically occupy more space. They may require dedicated floor space or additional infrastructure to accommodate their larger footprint.
Temperature Control and Uniformity:
Temperature control and heat distribution differ between vertical and horizontal tube furnaces. Vertical tube furnaces provide excellent temperature uniformity along the length of the sample due to the vertical orientation and the surrounding heating element. This ensures consistent heating and reliable results. Horizontal tube furnaces, while still capable of maintaining uniform temperatures, may experience slight temperature variations along the length of the sample due to the horizontal orientation. Careful optimization of temperature profiles may be required to ensure uniform heat distribution.
How to choose Tube Thermal Furnace
Confirm working temperature range firstly:
Namely 30-1100°C, 1200-1300°C, 1400-1700°C. By this mean, it is important to know the actual working temperature of the loaded materials. In addition, price and furnace structures differs much among temperature ranges.
Needed heating zone:
Single zone, 2 zone, multi-zone tube furnace, a suitable working space will improve the heating performance and cost less

Kind of thermal treatment:
Heat treatment processes affect the furnace configurations. For example, for quenching test , a vertical tube furnace is better
Furnace chamber working conditions:
Sometimes, the processed conditions affect the furnace structure much. For example, kind of atmospheres, vacuum level etc.
FAQ
As one of the most professional thermal processing equipment manufacturers and suppliers in China, we're featured by quality products and good price. Please rest assured to buy customized thermal processing equipment from our factory. For quotation and pricelist, contact us now.
Low Temperature RTP Furnace, Thermal Processing Tube Furnace, Wet Oxidation System
