Electron Beam Evaporator

Electron Beam Evaporator

This Wafer Scrubber is a true workhorse—handles 6-inch to 12-inch wafers, and fits right into both wafer fabrication and advanced packaging workflows.
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Description

Product overview

 

Nice-tech's Electron Beam Evaporator are a series of high-performance PVD (Physical Vapor Deposition) equipment developed for diverse industrial production and scientific research needs. Covering wafer-level mass production, large-size workpiece coating, small-batch R&D, and specialized process scenarios, the product line includes multiple models such as EBE 700, EBE 600 / EBE 600P, EBE 500, EBE 400, EBE300 / EBE300P, EBE 200 /EBE 200P, EBE 100. Each system integrates advanced vacuum coating technology and world-class core components (from brands like Edwards, Pfeiffer, and MKS), paired with the self-developed VKOS fully automatic control system, ensuring stable, reliable, and efficient film deposition.


The product series features flexible structural designs-including single-chamber, dual-chamber, and compact configurations-to adapt to different space and process requirements. Key performance indicators stand out: coating uniformity as precise as ±2% (most models) and ±3% (compact models), ultimate vacuum reaching 1E-5Pa to 2E-5Pa, and temperature control ranges spanning from -50℃ to 500℃ (or RT to 500℃) to meet the deposition needs of various materials. Whether it's wafer-level mass production, complex multi-layer film preparation, or laboratory R&D verification, Vikaitech's electron beam evaporation systems deliver tailored solutions.

 

Advantages

 

  • Superior Film Quality & High Consistency
  • Diversified Models for Targeted Needs
  • High Automation & Easy Maintenance
  • Strong Compatibility & Customization
  • Reliable Core Configurations

 

Applications

 

  • Semiconductor & Microelectronics
  • Optoelectronics & Optical Communication
  • Aerospace & Infrared Detection
  • Biomedicine & New Materials
  • Industrial Mass Production
  • Scientific Research & Universities

 

Parameters

 

Item

EBE 700 (High-End Mass Production Type)

EBE 600/ EBE 600P (Production Dual-Chamber Type)

EBE 500 (Universal Dual-Chamber Type)

EBE 400 (R&D Dual-Chamber Type)

EBE300 /EBE 300P (Production

Single-Chamber Type)

EBE 200 /EBE 200P (Universal Single-Chamber Type)

EBE 100 (Compact Type)

Coating Uniformity

±2%

±3%

Coating Repeatability

±2%

Ultimate Vacuum

2E-5Pa

1E-5Pa

1E-5Pa

1E-5Pa

2E-5Pa

1E-5Pa

1E-5Pa

Temperature Control Range

RT ~ 200℃

RT ~ 300℃

RT ~ 500℃

RT ~ 500℃

RT ~ 300℃

RT ~ 500℃

-50℃ ~ 500℃

Uniform Deposition Area

Wafer-Level (8-inch & Above for Mass Production)

Large-Size Workpieces (≤1000mm × 1000mm)

Universal Size (Suitable for Production & R&D)

Small-to-Medium Batch Workpieces (R&D & Small-Scale Production)

Large-Size Workpieces (≤1000mm ×1000mm)

Maximum Ø300mm (Wafer/Workpiece)

Laboratory-Scale Small Size (≤Ø150mm )

Chamber Type

Single Chamber (Wafer-Level Fully Automatic)

Dual Chamber (Production Type, Independent Process Chamber)

Dual Chamber (Universal Type, Mutual Load Lock)

Dual Chamber (R&D Type, Upper-Lower Chamber Load Lock)

Single Chamber (Production Type, Large Chamber)

Single Chamber (Universal Type, Standard Chamber)

Single Chamber (Compact Type, Small Chamber)

Loading System

Automatic Wafer Transfer

Automatic Robot Transfer

Single/Multi-Wafer Automatic Load Lock

Single/Multi-Wafer Automatic Load Lock

Automatic Robot Transfer

Manual/Semi-Automatic Loading

Manual Loading (Portable)

L×W×H(m)

8.5×5.5×3.3

4.4×4.1×2.6

4.0×3.1×2.9

3.0×2.5×2.2

4.05×3.9×2.8

3.35×2.8×2.2

3.15×2.4×2.2

Net Weight (Approx.)

12000kg

8500kg

6800kg

4200kg

7200kg

5500kg

3800kg

 

FAQ

 

Q: What's the core application?

A: High-precision thin-film deposition for semiconductor, optoelectronics, aerospace, biomedicine, and new material R&D.

Q: What materials are compatible?

A: Metals (Al, Au), dielectrics (SiO₂), semiconductors, compounds, ceramics; T360 optimized for indium deposition.

Q: Key performance specs?

A: Coating uniformity ±2% (production models)/±3% (R&D/compact); repeatability ±2%; ultimate vacuum 1E-5Pa~2E-5Pa.

Q: Can configurations be upgraded?

A: Yes-add ion sources, pre-vacuum chambers, fixtures, or automatic loadlocks (model-dependent).

Q: Installation & training included?

A: On-site installation/commissioning + operation/maintenance training; remote guidance available.

 

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