Product overview
Nice-Tech's resistance evaporation systems are purpose-built PVD gear for high-quality thin-film deposition-two core models to cover your needs: the RES 100 and RES 200I.
The RES 100 is a compact all-rounder (does both electron beam and resistance evaporation) with a space-saving design-perfect if your lab or production area is tight on room. The RES 200I? It's a specialist, built specifically for professional indium bump deposition jobs.
Both models pack mature resistance heating tech, top-tier vacuum components, and Vikaitech's own VKOS fully automatic control system-so you get consistent, reliable film formation every time. Performance-wise, they deliver: ±3% coating uniformity, ±2% repeatability, and an ultimate vacuum of 1E-5Pa. Whether you're running lab R&D tests or specialized industrial production, these systems check all the boxes.
Advantages
Targeted Performance
RES 200I optimizes indium bump deposition for inversion welding; RES 100 does dual electron beam/resistance evaporation, fitting small-batch multi-material jobs.
Compact & Efficient
RES 100's 3.15m×2.4m×2.2m footprint saves space. Both models have simple maintenance and high automation, cutting manual work.
Stable Quality
Uses top-brand core components + precise temp control (RES 100: -50℃~500℃; RES 200I: -80℃~200℃) for consistent film purity.
Flexible Adaptation
Works with In, metals, dielectrics. Fits small-batch production/R&D; optional Dome/Plate fixtures for different workpieces.
Applications
Specialized Industrial Processes: RES 200I for indium bump deposition in inversion welding (electronic component assembly).
Laboratory & R&D: RES 100 supports small-batch new material R&D (precision optics, microelectronics) in universities/institutes.
Small-Batch Production: Custom electronic components, optical parts, biomedical devices (high-purity thin films).
Infrared & Optoelectronics: Specialized thin-film solutions for infrared detectors and optoelectronic devices.
Parameters
|
Category |
Item |
T360(Compact Type) |
T550I(Specialized Indium Evaporation Type) |
|
General Information |
Core Technology |
PVD-Resistance/Electron Beam Evaporation |
PVD-Resistance Evaporation(Indium Bump Deposition) |
|
Control System |
VKOS Fully Automatic Control System(Self-Developed) |
VKOS Fully Automatic Control System(Self-Developed) |
|
|
Core Components |
Internationally renowned brand parts(vacuum pump, gauge,etc.) |
Internationally renowned brand parts(vacuum pump, |
|
|
Performance Parameters |
Coating Uniformity |
±3% |
±3% |
|
Coating Repeatability |
±2% |
±2% |
|
|
Ultimate Vacuum |
1E-5Pa |
1E-5Pa |
|
|
Temperature Control Range |
-50℃~500℃ |
-80℃~200℃ |
|
|
lon Source |
Kaufman& Hall ion source |
Kaufman& Hall ion source |
|
|
Configuration Details |
Chamber Type |
Single compact chamber |
Single specialized chamber |
|
Fixtures |
Dome& Plate |
Specialized fixture for indium deposition |
|
|
Key Functions |
Dual-mode evaporation(resistance/electron beam); small-batch processing |
Professional indium bump deposition; inversion welding |
|
|
Physical Dimensions |
Space Requirements(LxWxH) |
3.15mx2.4mx2.2m |
3.3mx2.7mx2.2m |
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