Product overview
Customized Solution multi-functional ion implanter is a custom-oriented ion implantation platform. Targeting research institutes, universities and small-batch special-process semiconductor production lines, this equipment supports both gaseous and solid ion sources. The target chamber is configurable with high-temperature and low-temperature implantation modes. It is highly adaptable for material modification, advanced-material research, pilot-line semiconductor manufacturing and special-sample implantation for irregular small-size substrates. The platform supports personalized hardware and function customization according to customer-specific process requirements.
Advantages
Highly customizable architecture: Flexible configuration of ion source, target chamber, wafer holder and beam-line modules to match diverse non-standard process requirements. Both high-temperature and cryogenic implantation modes are available for the target chamber.
Dual-mode ion-source compatibility: Supports gaseous source and solid source operation, covering a broad range of implant ion species for material science and semiconductor R&D.
Wide substrate adaptability: Works with standard 4-/6-inch wafers as well as irregular small pieces, eliminating restrictions on sample form factor for laboratory-scale research.
Wide wafer-temperature tuning range: Supports process temperature from room temperature up to 550 °C, and optional cooling target chamber can be configured upon request for temperature-sensitive material experiments.
User-friendly for R&D scenarios: Simplified recipe setup, convenient beam-line debugging and flexible batch or single-sample injection, well-suited for academic research and small-volume pilot production.
Applications
Academic research & teaching: University laboratories, research institute material-science experiments
Material modification: Ion-beam modification of metals, ceramics, polymers and novel functional materials
Special semiconductor pilot manufacturing: Small-batch compound-semiconductor device trial production
Custom special-process implantation for irregular small-size samples
Parameters
|
Item |
Specification |
|
Wafer / Sample Size |
6 inch, 4 inch or irregular small pieces |
|
Energy Range (Single Charge) |
30-200 keV |
|
Implant Species |
P, B, As, Fe, H, He and other customized ions |
|
Process Wafer Temperature |
RT-550 °C; cooling target chamber optional on demand |
FAQ
Q: What customers is the Customized Solution multi functional implanter mainly for?
A: It is oriented to universities, scientific research institutes, and small scale special process semiconductor pilot production lines. It focuses on R&D and small batch trial run rather than high volume mass production of mainstream IC fabs.
Q: Can this machine process non standard irregular small samples?
A: Yes. Apart from standard 4 inch and 6 inch wafers, it supports irregular small size samples. Sample holders can be customized according to customer sample dimensions.
Q: What temperature options are available during implantation?
A: Standard configuration supports RT 550 °C high temperature implantation. A cooling target chamber for low temperature process can be added as a customized option.
Q: What ion source modes does the equipment support?
A: It is compatible with both gaseous ion source and solid ion source, covering B, P, As, Fe, H, He and other ion species; extra ion species can be realized via customized modification.
Q: Can it cooperate with other SEMICORE ZKX production grade implanters?
A: Yes. It can work together with CIP series medium current, CIC series high current, CIE 8000 high energy implanters. The customized platform can be used for pre research and recipe exploration before mass production on production grade equipment.
Q: What services can be obtained for this customized platform?
A: SEMICORE ZKX provides scheme customization, equipment installation & commissioning, spare parts supply, on site technical support, and auxiliary process exploration service for research oriented projects.
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