Nano 3D Lithography System

Nano 3D Lithography System

The Nano 3D Lithography System are advanced projection-based micro-stereolithography (PμSL) platforms designed for micro- and nano-scale additive manufacturing.
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Description

Product overview

The Nano 3D Lithography System are advanced projection-based micro-stereolithography (PμSL) platforms designed for micro- and nano-scale additive manufacturing.

Leveraging lithography-grade optical systems and maskless direct-write technology, the Ploceus series achieves industry-leading resolution down to 1 μm, enabling fabrication of complex high-aspect-ratio microstructures, multi-material devices, and ceramic components with exceptional dimensional accuracy.

 

The series includes multiple precision levels to meet diverse research and industrial requirements:

LSS-20 – Standard precision (20 μm)

LSS-10 / – High precision (10 μm)

LSS-05 – Advanced micro precision (5 μm)

LSS-02 – Ultra precision (2 μm)

LSS-01-DL/LSS-01-TL – Multi-lens alignment systems (up to 1 μm)

 

With modular configuration options, multi-resolution switching, and visual alignment capability, the Ploceus series supports both rapid prototyping and high-precision microfabrication.

 

Advantages

 

① Ultra-High Lithography Accuracy

Resolution from 20 μm down to 1 μm

Dimensional tolerance as low as ±3 μm

High aspect ratio structure fabrication

 

② Multi-Resolution Switching

Fast switching between 1 μm / 2 μm / 5 μm / 10 μm / 20 μm

One platform for different precision requirements

 

③ Multi-Material Compatibility

Resin

Biocompatible resin

Hydrogel (e.g., GelMA)

Alumina ceramic slurry

High-temperature engineering resin

 

④ Visual Alignment & WYSIWYG Processing

Real-time optical monitoring

Automatic leveling and focus

Multi-material heterogeneous alignment

Overlay alignment accuracy up to 2.5 μm

 

⑤ High-Speed Printing

5–50× faster than traditional microfabrication tools

Suitable for both prototyping and batch research production

 

⑥ Modular & Flexible Vat System

Mini vat (15 ml) for material development

Large vat for volume production

High-temperature printing module

Automatic de-bubbling system

 

Applications

 

 Biomedical & Life Sciences

· Microfluidic chips

· Organoid-on-a-chip platforms

· Microneedle arrays (solid & hollow)

· Tissue engineering scaffolds

· Drug delivery systems

· PDMS master molds

 

Advanced Materials & Metamaterials

Ceramic lattice structures

Gradient metamaterials

Triply periodic minimal surface (TPMS)

Mechanical metamaterials

Porous ceramic scaffolds

 

Micro-Mechanical & Functional Devices

· Micro gears

· Micro connectors

· Optical metasurfaces

· Micro-springs

· Functional microstructures

 

Parameters

 

Model

Lithography Accuracy

Min Layer Thickness

Printing Tolerance

Max Printing Size

Lens System

LSS-20

20 μm

5 μm

±50 μm

38×21×50 mm

Single lens

LSS-10

10 μm

5 μm

±20–25 μm

50×50×50 mm

Single lens

LSS-05

5 μm

3 μm

±10 μm

50×50×50 mm

Single lens

LSS-02

2 μm

3 μm

±5 μm

50×50×50 mm

Dual lens

LSS-01-DL

2 μm

3 μm

±5 μm

50×50×50 mm

Dual lens (alignment)

LSS-01-TL

1 μm

3 μm

±3 μm

50×50×50 mm

Triple lens (alignment)

 

 

FAQ

 

Q: 1. What technology does this system use?

A: The system is based on projection micro-stereolithography (PμSL) and maskless direct-write lithography technology, enabling high-precision micro/nano-scale 3D fabrication.

Q: 2. What is the highest resolution available?

A: Depending on the model, the lithography accuracy ranges from:
20 μm
10 μm
5 μm
2 μm
up to 1 μm (PL-3D-PT)

Q: 3. What materials are supported?

A: The system supports a wide range of materials, including:
Functional resins
Biocompatible resins
High-temperature engineering resins
Hydrogel (e.g., GelMA)
Alumina ceramic slurry
Custom material compatibility is available upon request.

Q: 4. Can it print ceramic structures?

A: Yes. Selected models support ceramic slurry printing, enabling fabrication of porous ceramic scaffolds, lattice structures, and metamaterials.

Q: 5. Does the system support multi-material printing?

A: Yes. Advanced models (PL-3D-PD / PL-3D-PT) support multi-material heterogeneous alignment printing with overlay alignment accuracy up to 2.5 μm.

Q: 6. What file formats are supported?

A: The system supports STL format for 3D model input.

Q: 7. What is the maximum printing size?

A: Depending on the model, the supported printing size can reach up to:
50 mm × 50 mm × 50 mm
Custom vat configurations are available.

Q: 8. What industries is this system suitable for?

A: Typical applications include:
Microfluidic chip fabrication
Microneedle arrays
Tissue engineering scaffolds
Metamaterials
Metasurfaces
Micro-mechanical devices
It is widely used in biomedical research, advanced materials, and microfabrication fields.

Q: 9. What are the installation requirements?

A: Temperature: 20–40°C
Humidity: RH < 60%
Standard laboratory environment
No cleanroom is required for basic operation (depending on application needs).

Q: 10. How does it compare to conventional SLA or DLP 3D printers?

A: The Ploceus system offers:
Lithography-grade optical accuracy
Micron-level resolution (1–5 μm)
Higher dimensional stability
Multi-material alignment capability
It is designed for micro/nano fabrication rather than general prototyping.

 

 

 

 

 

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