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Tube Thermal FurnaceVertical Tube Furnace saves space, fits ≤8-inch wafers (12-inch industrial option available). Key specs: 850mm max constant temperature zone, ±0.5℃ control accuracy.read more
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Mercury Annealing FurnaceThis Ion Beam Deposition Equipment is a high-precision thin film deposition system designed for the preparation of metal wire and ohmic contact thin films in infrared device manufacturing.read more
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SiC High Temperature Annealing FurnaceThe SiC High Temperature Annealing Furnace is a specialized piece of thermal processing equipment built for the production of silicon carbide (SiC) power devices. It’s mainly used to carry out...read more
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SiC High Temperature Oxidation FurnaceThis SiC high-temperature oxidation furnace is a specialized thermal processing device built for silicon carbide semiconductor manufacturing. It’s mainly used to grow high-quality gate oxide...read more
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Vertical Thermal Processing FurnaceOur Metal-Organic Chemical Vapor Deposition (MOCVD) equipment is a core manufacturing tool dedicated to the deposition of high-quality epitaxial materials. It is professionally designed for the...read more
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Vertical Oxidation And Annealing FurnaceOur vertical oxidation and annealing furnace is built for reliable thermal processing in semiconductor production. It handles oxidation, annealing, and alloying for wafers used in integrated...read more
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Semi-Automatic RTP EquipmentThis Semi-Automatic RTP Equipment is quite practical, capable of processing wafers from 8 to 12 inches. The Semi-Automatic RTP Equipment offers precise temperature control and a very low oxygen...read more
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Oxidation and Diffusion RTP EquipmentThe Oxidation and Diffusion RTP Equipment stands as a core thermal tool for semiconductors, packing oxidation, diffusion, and annealing capabilities into a single unit. It’s designed specifically...read more
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High-Temperature Oxidation RTP EquipmentOur company's High-Temperature Oxidation RTP Equipment is a core thermal equipment in large-scale semiconductor production. It is specifically designed to create clean, dense SiO₂ films on silicon...read more
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Desktop RTP EquipmentThe Desktop RTP Equipment Adaptable to small-sized wafers, the equipment features a compact design and flexible placement. Temperature control covers room temperature to 800℃ (thermocouple) and...read more
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Wet Oxidation FurnaceThis is a core process tool tailored specifically for making Wet Oxidation Furnace (Vertical-Cavity Surface-Emitting Laser (VCSEL) devices). It’s built to handle both optoelectronic and...read more
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Proton Exchange FurnaceThe Proton Exchange Furnace is a high-precision thermal processing device — it’s tailored specifically for manufacturing high-speed photonic devices. Built on a dual temperature zone synergistic...read more
380/530/830 mm. Phase. Three Phase. The high-temperature tube furnaces are available in either horizontal (type RHTH) or vertical (type RHTV) designs. High-quality insulation materials made of...
These compact tube furnaces are used when laboratory experiments must be performed horizontally, vertically, or at specific angles. The ability to configure the angle of tilt and the working height,...
With a full suite of standard features, this lab tube furnace can be fitted to suit your needs with customizable sizing and heating zone features. Request a quote today on a 1600°C high-temperature...
Muffle Furnace LX803MF. Add to compare. Chamber Size (W x L x H) mm: 250 x 320 x 200. Type: Benchtop. Furnace Structure: Chamber Material, Temperature Controller System, Heating Element, Furnace...
Muffle Furnace LX803MF. Add to compare. Chamber Size (W x L x H) mm: 250 x 320 x 200. Type: Benchtop. Furnace Structure: Chamber Material, Temperature Controller System, Heating...
Laboratory tube furnaces consist of heating coils surrounding a cylindrical cavity where temperature is controlled by a thermocouple. A tube furnace is available as single or multi...
