If you've ever scanned lithography system lists and wondered, "Which one actually fits my needs?"-you're not alone. Whether you're prototyping in a lab or scaling industrial production, choosing Nice-tech's Maskless UV Lithography model comes down to matching your goals to key specs. Let's break down our lineup to simplify your choice.
Start with Your "Must-Haves"
First, answer two questions to narrow options fast:
What's the smallest feature I need? (Ties to Critical Dimension/Minimum Lines/Spaces.)
How fast do I need to produce? (Relates to Exposure Speed.)
All our models skip physical masks (big for flexibility!), but they're optimized for precision, speed, or large substrates. Here's how they stack up.
1. Academic Research & Small-Batch Precision: MLM 100
For university labs or startups prototyping microdevices (MEMS, microfluidics), the UV Litho-ACA balances accuracy and space efficiency.
Precision: 0.8 μm Critical Dimension (CD), 1.0 μm lines/spaces (great for lab-scale work).
Speed: Up to 100 mm²/min (three lens options-ideal for iterative testing).
Space: Compact 750×800×700 mm (320 kg), needs just 1.5m×1.5m (fits small labs).
Bonus: Optional grayscale, supports GDS/DWG/DXF formats.

2. High-Precision Industrial Runs: MLM 200
When ultra-fine details (advanced sensors, high-density chips) and consistency matter, the UV Litho-ACA Pro+ delivers.
Precision: 0.4 μm CD, 0.8 μm lines/spaces, 350 nm overlay accuracy (sharp multi-layer structures).
Speed: Up to 100 mm²/min (four lenses-steady for small-to-medium production).
Perk: Grayscale supported (up to 4096 levels) for 3D microstructures (e.g., micro-optics).
Space: 2.2m×1.7m area (590 kg)-fits industrial setups.

3. Critical Grayscale Needs: MLM 300
If your project requires grayscale (no exceptions-e.g., custom micro-lenses, biomedical implants), the UV Litho-ACA Master is built for it.
Grayscale: Non-optional (no compromises on 3D quality).
Precision: Same as Pro+ (0.4 μm CD, 350 nm overlay accuracy).
Speed: Faster than Pro+ (up to 150 mm²/min)-better for slightly bigger batches.
Space: Same as Pro+ (2.2m×1.7m, 590 kg).

4. Mass Production & Large Substrates: MLM 400
For high-volume work (large displays, solar cells), the UV Litho-S prioritizes speed and size.
Speed: The fastest in our lineup-up to 2500 mm²/min (two lenses, cuts production time).
Substrates: Handles up to 200mm×200mm (others max at 150mm×150mm).
Precision: 1.0 μm CD, 2.0 μm lines/spaces (more than enough for industrial needs).
Space: 2.7m×2.3m area (1400 kg)-ideal for factory floors.

5. Precision + Large Substrates: MLM 500
If you need large substrates and better precision (high-end flexible sensors), the UV Litho-S+ hits the sweet spot.
Precision: 0.5 μm CD, 0.5 μm lines/spaces, 250 nm overlay accuracy (best in our lineup).
Speed: Up to 1200 mm²/min (three lenses-faster than ACA series for big substrates).
Substrates: 200mm×200mm max (scales without switching models).
Space: Same as UV Litho-S (2.7m×2.3m, 1400 kg).

Quick Cheat Sheet: Match Your Project
|
Project Type |
Best Model |
Key Reason |
|
Lab research(small batches) |
MLM 100 |
Compact+ balanced precision/speed |
|
High-precision industrial runs |
MLM 200 |
0.4μm CD+ supported grayscale |
|
Critical grayscale work |
MLM 300 |
Non-optional grayscale+ top precision |
|
Mass production(large substrates) |
MLM 400 |
2500 mm2/min+200mmx200mm support |
|
Precision large-substrate work |
MLM 500 |
0.5μm CD+200mmx200mm size |
Final Notes
All models of our Maskless UV Lithography include automated lens switching (saves time!) and ISO certifications (ISO 9001/14001/45001 for reliability). We also offer custom extra-large exposure areas (up to 4 m²)-just ask.
The "right" model isn't the priciest-it's the one that checks your boxes. Have questions about a use case? Contact us now to choose the most suitable Maskless UV Lithography solution.

