This fully automatic in-line laminar flow dryer slots right into cleaning or etching setups-custom-built to fit your semiconductor process needs. It's designed to follow QDR or ultra-pure water (DIW) chip cleaning, locking in a "Dry in → Dry out" workflow that cuts down on moisture hold-ups.
Crafted with SUS-304 electrolytic chemical treatment (EP) for the basket holder, turntable, and contact liquid chamber, it handles 6-inch/4-inch "full cover" cassettes (supplied by you) and semiconductor materials 300μm and thicker. The fragmentation rate stays under 1 in 10,000 for machine-related issues-defective products excluded, of course.
Key bits: PLC smart control for reliable, intuitive operation; a 3HP variable frequency motor (0-999RPM) with belt drive that's low on maintenance; nitrogen-sealed spindle (maze design) to keep the chamber isolated. Plus, an ion remover, air filtration, and imported silicone + electric heating-no drips post-drying.
At 780×1510×1140mm (door height 1820mm) and ~450kg, it has a 4-station symmetrical layout. The stainless steel door is cylinder-driven (rear 90° opening) with fluorine rubber sealing. Exhaust (110mm diameter) and drainage (DN32 PVC) interfaces make integration a breeze.
For semiconductor manufacturers, it's a solid pick-stable (≤90μm vibration at 350RPM), precise, and built to minimize waste while keeping workflows on track. No frills, just reliable performance for your production line.
