By analyzing the old process and usage of LPCVD Reactor, LPCVD System, 3D Surface Topography Measurement System we have formulated a new process, thereby improving product quality and economic benefits.We believe that long time period partnership is a result of top of the range, value added services, rich expertise and personal contact for cvd machine.Our company is dedicated to providing value for money and a high return on investment for our customers. Our team is passionate about achieving excellence in every project we undertake. We are dedicated to providing a reliable and trustworthy service to our customers. We are dedicated to providing top-quality solutions that meet the unique needs of our clients and partners. We have a strong product R & D capabilities, and high quality, variety of products known.
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LPCVD EquipmentLPCVD (Low Pressure Chemical Vapor Deposition) is a core semiconductor process tech—under low-pressure conditions, it heats gaseous compounds to trigger reactions, depositing stable solid thin...read more
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Industrial MOCVD SystemNice-Tech CV600/CV700 series are high-end mass-production MOCVD devices for compound semiconductor epitaxial growth, adopting proprietary planetary-satellite dual rotation technology to realize...read more
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Standard MOCVD SystemNice-Tech MC150/MC200/MC300 series MOCVD equipment adopts the close-coupled vertical showerhead gas injection model, with inherent epitaxial uniformity advantages via high-density staggered source...read more
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IBD SystemThis Ion Beam Deposition Equipment is a high-precision thin film deposition system designed for the preparation of metal wire and ohmic contact thin films in infrared device manufacturing.read more
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Vertical LPE SystemThis vertical liquid phase epitaxy furnace is built for the liquid-phase epitaxial growth of HgCdTe thin-film materials, with a focus on producing As-doped P-type materials used in P-on-N...read more
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Vertical LPCVD SystemThe Vertical LPCVD TEOS/Poly/SiN is a low-pressure chemical vapor deposition system for semiconductor manufacturing. It’s used to deposit high-quality Poly, TEOS, SiN, and HTO thin films.read more
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MBE SystemOur Molecular Beam Epitaxy (MBE) system is a high-precision epitaxial growth equipment dedicated to compound semiconductor materials, especially ultra-thin heterostructure materials. It is mainly...read more
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PECVD EquipmentNice-Tech has rolled out three PECVD models—Depomerits PE 100, PE 200, and PE 300—and together they form a product matrix that’s got every key scenario covered: from lab research to small-batch...read more
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ICP-CVD SystemNice-Tech’ 8-inch ICP-CVD system is designed for thin-film deposition on 8-inch wafers. It generates high-density plasma via inductive coupling (ICP) and establishes bias through capacitive...read more
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Ion Beam Deposition SystemNice-Tech’ 8-inch IBD system is specialized for low-temperature, high-density, and high-uniformity thin-film deposition on 8-inch wafers. It uses sputtering technology with a dual-ion-source setup...read more
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