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Tube Thermal FurnaceVertical Tube Furnace saves space, fits ≤8-inch wafers (12-inch industrial option available). Key specs: 850mm max constant temperature zone, ±0.5℃ control accuracy.read more
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Mercury Annealing FurnaceThis Ion Beam Deposition Equipment is a high-precision thin film deposition system designed for the preparation of metal wire and ohmic contact thin films in infrared device manufacturing.read more
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SiC High Temperature Annealing FurnaceThe SiC High Temperature Annealing Furnace is a specialized piece of thermal processing equipment built for the production of silicon carbide (SiC) power devices. It’s mainly used to carry out...read more
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SiC High Temperature Oxidation FurnaceThis SiC high-temperature oxidation furnace is a specialized thermal processing device built for silicon carbide semiconductor manufacturing. It’s mainly used to grow high-quality gate oxide...read more
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SiC Epitaxy FurnaceOur SiC epitaxy furnace is a specialized piece of equipment built for the homoepitaxial growth of 4H-SiC, a core material in third-generation semiconductors.read more
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Vertical Thermal Processing FurnaceOur Metal-Organic Chemical Vapor Deposition (MOCVD) equipment is a core manufacturing tool dedicated to the deposition of high-quality epitaxial materials. It is professionally designed for the...read more
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Vertical Oxidation And Annealing FurnaceOur vertical oxidation and annealing furnace is built for reliable thermal processing in semiconductor production. It handles oxidation, annealing, and alloying for wafers used in integrated...read more
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Semi-Automatic RTP EquipmentThis Semi-Automatic RTP Equipment is quite practical, capable of processing wafers from 8 to 12 inches. The Semi-Automatic RTP Equipment offers precise temperature control and a very low oxygen...read more
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High-Temperature Oxidation RTP EquipmentOur company's High-Temperature Oxidation RTP Equipment is a core thermal equipment in large-scale semiconductor production. It is specifically designed to create clean, dense SiO₂ films on silicon...read more
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Low-Temperature RTP EquipmentLow-Temperature RTP Equipment: It offers exceptionally precise temperature control from 250℃ to 500℃, handling heat treatment of materials such as lithium niobate and silicon effectively.read more
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Automatic RTP EquipmentThe Automatic RTP Equipment compatible with 8-12 inch wafers, featuring single/dual-cavity designs, and specifically designed for mass production. Integrating robots and other components, it...read more
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Proton Exchange FurnaceThe Proton Exchange Furnace is a high-precision thermal processing device — it’s tailored specifically for manufacturing high-speed photonic devices. Built on a dual temperature zone synergistic...read more
LF.St series . Horizontal Tube Furnace High Quality 24/7 Continuos-Tº Tube Furnaces Temperature range up to 1800ºc Sturdy Design • Brick Insulation (23/26) And Fiber Insulation (300-400) Split /...
High-Temperature Tube Furnaces for Horizontal or Vertical Operation up to 1800 °C By using different gas supply systems, operations can be performed under non-flammable or flammable...
Shop for 1600 degree Celsius tubular furnaces at SentroTech. These horizontal tube furnaces have a custom heating zone length up to 48 inches. This horizontal tube furnace works great for inert gas...
These tube furnaces can be used for horizontal (RSH) or vertical (RSV) operation. The split-type design makes it easy to change the working tube. It allows for a comfortable exchange of various...
Get a customized horizontal tube furnace for your company's lab or production facility. With operating temperatures up to 1500°C, a tubular furnace from SentroTech can perform a number of different...
High purity diffusion, annealing and oxidation The diffusion furnace HTF is equipped with up to 4 individually controllable tubes. The loading and unloading of boats in the tubes is done...
