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LPCVD EquipmentLPCVD (Low Pressure Chemical Vapor Deposition) is a core semiconductor process tech—under low-pressure conditions, it heats gaseous compounds to trigger reactions, depositing stable solid thin...read more
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Industrial MOCVD SystemNice-Tech CV600/CV700 series are high-end mass-production MOCVD devices for compound semiconductor epitaxial growth, adopting proprietary planetary-satellite dual rotation technology to realize...read more
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Standard MOCVD SystemNice-Tech MC150/MC200/MC300 series MOCVD equipment adopts the close-coupled vertical showerhead gas injection model, with inherent epitaxial uniformity advantages via high-density staggered source...read more
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Vertical LPCVD SystemThe Vertical LPCVD TEOS/Poly/SiN is a low-pressure chemical vapor deposition system for semiconductor manufacturing. It’s used to deposit high-quality Poly, TEOS, SiN, and HTO thin films.read more
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MBE SystemOur Molecular Beam Epitaxy (MBE) system is a high-precision epitaxial growth equipment dedicated to compound semiconductor materials, especially ultra-thin heterostructure materials. It is mainly...read more
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PECVD EquipmentNice-Tech has rolled out three PECVD models—Depomerits PE 100, PE 200, and PE 300—and together they form a product matrix that’s got every key scenario covered: from lab research to small-batch...read more
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ICP-CVD SystemNice-Tech’ 8-inch ICP-CVD system is designed for thin-film deposition on 8-inch wafers. It generates high-density plasma via inductive coupling (ICP) and establishes bias through capacitive...read more
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Ion Beam Deposition SystemNice-Tech’ 8-inch IBD system is specialized for low-temperature, high-density, and high-uniformity thin-film deposition on 8-inch wafers. It uses sputtering technology with a dual-ion-source setup...read more
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Resistance Evaporation SystemsNice-Tech’s resistance evaporation systems are purpose-built PVD gear for high-quality thin-film deposition—two core models to cover your needs: the RES 100 and RES 200I.read more
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Electron Beam EvaporatorThis Wafer Scrubber is a true workhorse—handles 6-inch to 12-inch wafers, and fits right into both wafer fabrication and advanced packaging workflows.read more
Web• This is the flow of the reactants through the CVD chamber. • The goal is to deliver the gas uniformly to the substrate. • The flow needs to be optimized for maximum deposition rate....
Web2 days ago · The Diamond CVD Reactor Market Report presents a comprehensive analysis of the leading competitors in the market, incorporating historical data, SWOT analysis,...
WebCVD is similar to the PVD processes, but CVD uses a gas-phase precursor rather than a solid precursor. The CVD process chemically transforms the gaseous precursor into a...
WebJan 14, 2021 · The initiated CVD method utilizes an initiator and monomers as vapour-phase reactants, which absorb and undergo chain-growth polymerization on the cooled...
Web• Hot wall reactors have a more uniform temperature distribution but the surface of the reactor walls can also get coated. This limits the reactor to one species. Used more for...
WebCVD Reactors Chemical vapor deposition (CVD) reactors are used in applications that involve the deposition of a layer or layers of a substance onto a surface. The figure below...
